In this work, closed-field unbalanced dual magnetron system (DCFUBM) was introduced in a new constructed design to be in a dc plasma sputtering system. This design was employed for achieving one of essential requirements in magnetron sputtering process ; that is inventory of the charged particles near the two electrodes in order to minimize the energy requires for performing the electrical discharge as well as to heighten the sputter rate and produced a homogenous structures from where density and distribution at the deposition . The proposed design tested through a computer model that supplied with data from the previous results and then from the direct experiment measurements of the magnetic field distribution between the electrodes. It followed the fixing of (DCFUBM) system inside a dc plasma sputtering system and operating it in order to investigate the using of such system on the plasma characteristics .the experimental results obtained show significant improvement in the plasma characteristics compared with the cases of using one and without magnetron. Also, the samples of Nickel oxide were prepared using (DCFUBM ) system and the structural and microscopic tests showed the production of nanostructures with high purity and a homogeneous surface distribution . The proposed design can be used towards an improved production process of different nanomaterials with lower cost, higher quality and more regularity than the structures obtained using conventional designs of magnetron